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ITO-on-top organic light-emitting devices: a correlated study of opto-electronic and structural characteristics

机译:顶部ITO有机发光器件:光电和结构特征的相关研究

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This paper reports on a complementary investigation of the structural and opto-electronic characteristics of top-emitting organic light-emitting diodes (OLEDs). The key point of such a procedure is the deposition of the indium tin oxide (ITO) transparent top electrode onto the organic films structure. This was achieved by RF sputtering under soft enough conditions so as to avoid any deterioration of the underlying organic layers (room temperature deposition, low plasma power density and minimal bombardment effect) as much as possible. The electrical and optical properties of ITO as a function of the deposition conditions are described first. Hall effect measurements show that ITO films can be grown at room temperature with a high mobility (40 cm~2 V~(-1) s~(-1)) and a carrier density exceeding 5 x 10~(20) cm~(-3). The surface roughness as a function of the plasma conditions was determined by AFM and can be as low as 1.2 nm. Hole only silicon/Al/poly(N-vinylcarbazole) (PVK)/poly(3,4)ethylenedioxythiophene (PEDOT)/sputtered ITO diodes were processed and characterized both structurally (high resolution TEM in cross section) and electrically. An excellent agreement between the interfacial ITO/PEDOT structure and the hole injection performance was evidenced. Glass/ITO/PEDOT/PVK/Alq/BCP/ITO top-emitting OLED were processed and characterized.
机译:本文报告了对顶部发光有机发光二极管(OLED)的结构和光电特性的补充研究。这种方法的关键是将铟锡氧化物(ITO)透明顶部电极沉积到有机膜结构上。这是通过在足够柔软的条件下进行RF溅射来实现的,从而尽可能避免底层有机层的任何劣化(室温沉积,低等离子功率密度和最小轰击效应)。首先描述ITO的电学和光学特性随沉积条件的变化。霍尔效应测量表明,ITO薄膜可以在室温下以高迁移率(40 cm〜2 V〜(-1)s〜(-1))生长,载流子密度超过5 x 10〜(20)cm〜( -3)。表面粗糙度随等离子体条件的变化由AFM确定,可以低至1.2 nm。仅对硅/ Al /聚(N-乙烯基咔唑)(PVK)/聚(3,4)乙撑二氧噻吩(PEDOT)/溅射的ITO二极管进行孔处理,并在结构上(截面为高分辨率TEM)和电学特性进行了表征。界面ITO / PEDOT结构与空穴注入性能之间的良好一致性被证明。对玻璃/ ITO / PEDOT / PVK / Alq / BCP / ITO顶部发光OLED进行了处理和表征。

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