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X-ray, absorption and photocurrent properties of thin-film GaAs on glass formed by pulsed-laser deposition

机译:脉冲激光沉积在玻璃上形成的薄膜GaAs的X射线,吸收和光电流特性

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摘要

By employing pulsed-laser deposition, thin-film GaAs on glass has been deposited. X-ray analysis showed that the material has a polycrystalline texture with a crystal size of 58 nm. The absorption of the film has been measured by standard constant photocurrent measurements and the photocurrent itself with the lock-in technique. Absorption and photocurrent have been straightforwardly modelled with the crystalline density of state function and Urbach's tail. The work reveals the capability of pulsed-laser deposition to form high-quality GaAs films on glass for optical applications.
机译:通过采用脉冲激光沉积,已经在玻璃上沉积了薄膜GaAs。 X射线分析表明,该材料具有晶体大小为58nm的多晶织构。膜的吸收已通过标准的恒定光电流测量进行了测量,而光电流本身则通过锁定技术进行了测量。已经利用状态函数和Urbach尾巴的晶体密度直接对吸收和光电流进行了建模。这项工作揭示了脉冲激光沉积在玻璃上形成光学应用的高质量GaAs膜的能力。

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