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Preparation and characteristics of ordered porous ZnO films by a electrodeposition method using PS array templates

机译:PS阵列模板的电沉积法制备有序多孔ZnO薄膜及其特性

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Ordered porous ZnO films were electrodeposited on an ITO glass substrate covered with PS array templates by using a zinc nitrate aqueous solution as the electrolyte. The electrochemical deposition process was analysed and the characteristics of the porous films were discussed. The results showed that Zn~(2+) had an analogous catalysis to NO_3~- during the nucleation-growth process of ZnO, and its concentration had an important effect on the current density, growth rate and the film morphology. Deposition temperature also had a relation with the induction period time and film morphology. The porous film prepared at 0.1 M Zn(NO_3)_2, -1.1 V potential and 70℃ was a hexagonal wurtzite structure. The approximate specific surface area was 2.76 m~2 g~(-1). The optical transmittance spectrum gave a relatively high transmittance of 60% beyond 500 nm, and the optical band-gap of the ZnO film was 3.36 eV.
机译:通过使用硝酸锌水溶液作为电解质,将有序的多孔ZnO膜电沉积在覆盖有PS阵列模板的ITO玻璃基板上。分析了电化学沉积过程,并讨论了多孔膜的特性。结果表明,Zn〜(2+)在ZnO成核生长过程中具有与NO_3〜-相似的催化作用,其浓度对电流密度,生长速率和薄膜形貌有重要影响。沉积温度还与诱导期时间和膜形态有关。在0.1 M Zn(NO_3)_2,-1.1 V电势和70℃下制备的多孔膜为六方纤锌矿结构。比表面积约为2.76 m〜2 g〜(-1)。光学透射光谱在500nm以上给出相对高的透射率60%,并且ZnO膜的光学带隙为3.36eV​​。

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