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The effect of carbon on neutral base recombination in high-speed SiGeC heterojunction bipolar transistors

机译:碳对高速SiGeC异质结双极晶体管中中性基复合的影响

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This paper deals with the introduction of high carbon doses in the base of SiGeC HBTs to create neutral base recombination (NBR). The base current I_B was increased by a factor of 10, with significant enhancement of the collector-to-emitter breakdown voltage BV_(CEO). The transit frequency f_T was kept nearly constant, which enabled the f_T x BV_(CEO) product to be pushed up. The analysis is followed by 1/f noise measurements, temperature analysis and device simulations to demonstrate a trap saturation effect. Electrical bandgap measurements enable us to discern whether carbon is inserted in substitutional or interstitial sites.
机译:本文介绍了在SiGeC HBT的基础上引入高碳剂量以创建中性碱基重组(NBR)。基本电流I_B增加了10倍,集电极-发射极击穿电压BV_(CEO)大大提高。过渡频率f_T几乎保持恒定,这使f_T x BV_(CEO)产品被推高。分析之后进行1 / f噪声测量,温度分析和器件仿真,以证明陷阱的饱和效应。电带隙测量使我们能够辨别碳是插入取代位置还是填隙位置。

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