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Multiphononon resonant Raman scattering in He~+-implanted InGaN

机译:He〜+注入的InGaN中的多声子共振拉曼散射

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摘要

We present Raman-scattering measurements on InGaN epilayers with In content ranging from 17% to 42% which have been implanted with different He~+ doses. Raman spectra obtained using near-resonance visible excitation (514.5 nm) and above band-gap UV excitation (325 nm) are measured in order to study the resonant behaviour of the samples and to assess its crystalline quality. The spectra obtained with UV excitation show resonant LO multiphonon scattering up to fifth order, whose relative intensities depend on the indium concentration and implantation dose. An assessment of the degree of lattice disorder introduced by the implantation can be obtained from the analysis of the Raman spectra in terms of relative intensities and line broadenings of the multiphonon peaks.
机译:我们对InGaN外延层进行了拉曼散射测量,InGaN外延层的In含量为17%至42%,并已注入了不同的He〜+剂量。测量使用近共振可见光激发(514.5 nm)和以上带隙紫外线激发(325 nm)获得的拉曼光谱,以研究样品的共振行为并评估其晶体质量。通过紫外线激发获得的光谱显示出共振LO多声子散射直至五阶,其相对强度取决于铟浓度和注入剂量。根据多声子峰的相对强度和谱线展宽,可以通过对拉曼光谱的分析来获得对由注入引入的晶格无序程度的评估。

著录项

  • 来源
    《Semiconductor science and technology》 |2014年第4期|045013.1-045013.5|共5页
  • 作者单位

    Institut Jaume Almera, Consell Superior d'Investigacions Cientifiques (CSIC), Lluis Sole i Sabaris s.n., E-08028 Barcelona, Catalonia, Spain;

    Institut Jaume Almera, Consell Superior d'Investigacions Cientifiques (CSIC), Lluis Sole i Sabaris s.n., E-08028 Barcelona, Catalonia, Spain;

    Dept de Fisica Aplicada Ⅲ (Electricidad y Electronica), Univ. Complutense de Madrid, E-28040 Madrid, Spain,CEI Campus Moncloa, UCM-UPM, E-28040 Madrid, Spain;

    Dept de Fisica Aplicada Ⅲ (Electricidad y Electronica), Univ. Complutense de Madrid, E-28040 Madrid, Spain,CEI Campus Moncloa, UCM-UPM, E-28040 Madrid, Spain;

    Department of Physics, University of Houston, 4800 Calhoun, Houston, TX 77004, USA;

    Department of Physics, University of Houston, 4800 Calhoun, Houston, TX 77004, USA;

    Institut Jaume Almera, Consell Superior d'Investigacions Cientifiques (CSIC), Lluis Sole i Sabaris s.n., E-08028 Barcelona, Catalonia, Spain;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    resonant Raman scattering; InGaN; He-implanted layers;

    机译:共振拉曼散射;氮化镓;他植入的层;
  • 入库时间 2022-08-18 01:30:27

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