机译:从高T_c超导体到高度相关的Mott绝缘体-莱比锡25年脉冲激光沉积功能性氧化物的过程
Semiconductor Physics Group, Institut fuer Experimentelle Physik Ⅱ, Universitaet Leipzig, Linnestr. 5, D-04103 Leipzig, Germany;
Semiconductor Physics Group, Institut fuer Experimentelle Physik Ⅱ, Universitaet Leipzig, Linnestr. 5, D-04103 Leipzig, Germany;
Semiconductor Physics Group, Institut fuer Experimentelle Physik Ⅱ, Universitaet Leipzig, Linnestr. 5, D-04103 Leipzig, Germany;
Semiconductor Physics Group, Institut fuer Experimentelle Physik Ⅱ, Universitaet Leipzig, Linnestr. 5, D-04103 Leipzig, Germany;
Semiconductor Physics Group, Institut fuer Experimentelle Physik Ⅱ, Universitaet Leipzig, Linnestr. 5, D-04103 Leipzig, Germany;
Semiconductor Physics Group, Institut fuer Experimentelle Physik Ⅱ, Universitaet Leipzig, Linnestr. 5, D-04103 Leipzig, Germany;
pulsed laser deposition; functional oxide films; semiconducting oxide films; highly correlated oxide films; multiferroic composites; heterostructures; epitaxy;
机译:使用脉冲激光沉积在25°C下生长的具有低颗粒密度的高T_c超导NbN薄膜
机译:使用Nd:YAG激光在266 nm处的第四次谐波的脉冲激光沉积氧化物超导膜
机译:Yb_2Cu_3O_7超导体集成的PbZr_(0.52)Ti_(0.48)O_3和SrBi_2Nb_2O_9铁电氧化物通过脉冲激光沉积外延生长
机译:氧化物的脉冲激光沉积:高T_c超导体和压电
机译:脉冲激光沉积生长氧化铋超导体。
机译:脉冲激光沉积原位生长SmO1-xFxFeAs薄膜
机译:电子氧化物的脉冲激光沉积:超导体和半导体应用
机译:脉冲激光沉积电子氧化物:超导体和半导体应用