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Variable range hopping crossover and magnetotransport in PLD grown Sb doped ZnO thin film

机译:PLD生长的Sb掺杂ZnO薄膜的变程跳变交叉和磁传输

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We report on the variable range hopping (VRH) crossover in the electrical transport of Sb doped ZnO (SZO) thin film. Structural, chemical, electrical and magnetotransport properties were carried out on SZO thin film grown by pulsed laser deposition. X-photoelectron spectroscopy study confirms the presence of both Sb3+(33%) and Sb5+(67%) states. Sb doped ZnO thin film shows n-type behavior which is attributed to the formation of Sb-Zn and/ or Sb-Zn-V-Zn defect complex. Temperature dependent resistivity measurement showed that in a low temperature regime (< 90 K) transport is governed by the 3D-VRH mechanism. A crossover from 3D-VRH to Efros-Shklovoski VRH was observed around 12 K. Negative magnetoresistance (MR) is observed in the entire temperature range (300-5 K), however, there is an upturn in the MR behavior at 5 K suggesting the existence of a positive component. The MR behavior of Sb doped ZnO thin films is explained by the Khosla and Fischer model.
机译:我们报告了掺杂锑的ZnO(SZO)薄膜的电传输中的变程跳变(VRH)交叉。在通过脉冲激光沉积生长的SZO薄膜上进行了结构,化学,电和磁传输性质。 X光电子能谱研究证实了Sb3 +(33%)和Sb5 +(67%)状态的存在。掺Sb的ZnO薄膜表现出n型行为,这归因于Sb-Zn和/或Sb-Zn-V-Zn缺陷络合物的形成。温度相关的电阻率测量结果表明,在低温条件下(<90 K),传输受3D-VRH机制控制。在12 K附近观察到了从3D-VRH到Efros-Shklovoski VRH的交叉。在整个温度范围(300-5 K)内都观察到负磁阻(MR),但是在5 K时MR行为呈上升趋势,这表明积极成分的存在。用Khosla和Fischer模型解释了掺Sb的ZnO薄膜的MR行为。

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