Characterization of thin titanium silicide films prepared by PASET and a conventional process

摘要

An advanced silicide process featuring pre-amorphization before Ti film deposition and sequential two-step annealing (PASET) has been used to prepare thin titanium silicide films. Pre-amorphization by As implantation produces TiSi_2 films with low and uniform sheet resistance. The TiSi_2 film properties have been compared with those of a film prepared by a conventional two-step annealing technique. Non-destructive and non-contacting characterization techniques such as spectroscopic ellipsometry, atomic force microscopy and thermal wave analysis have been employed along with traditional tools (XRD, four-point probe, TEM) to characterize the TiSi_2 films. Optical properties such as refractive indices (n, k) of the TiSi_2 films are presented.