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Investigation of defect levels in sem-insulating materials by modulated and transient photocurrent: comparison of methods

机译:用调制光和瞬态光电流研究半绝缘材料中的缺陷水平:方法比较

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摘要

High-resolution photoinduced transient spectroscopy and the modulated photocurrent technique are compared in terms of possible application to the investigation of defect levels in semi-insulating monocrystalline materials. After a description of the theoretical and experimental aspects, the advantages, drawbacks and limitations of each method are discussed. The two techniques complement each other and their potentialities are exemplified by the measurements of trap parameters in the same samples of semi-insulating Cr-doped and undoped GaAs. From these results we deduce a possible model for the properties of the Cr defect in GaAs.
机译:就可能用于半绝缘单晶材料中缺陷水平研究的应用方面,比较了高分辨率光致瞬态光谱法和调制光电流技术。在理论和实验方面的描述之后,讨论了每种方法的优点,缺点和局限性。两种技术相辅相成,其潜力通过对半绝缘Cr掺杂和未掺杂GaAs的相同样品中的陷阱参数进行测量来举例说明。根据这些结果,我们得出了GaAs中Cr缺陷性质的可能模型。

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