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Surface termination and Schottky-barrier formation of In_4Se_3(001)

机译:in_4se_3(001)的表面终端和肖特基屏障形成

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The surface termination of In4Se3(001) and the interface of this layered trichalcogenide, with Au, was examined using x-ray photoemission spectroscopy. Low energy electron diffraction indicates that the surface is highly crystalline, but suggests an absence of C-2v mirror plane symmetry. The surface termination of the In4Se3(001) is found, by angle-resolved x-ray photoemission spectroscopy, to be In, which is consistent with the observed Schottky barrier formation found with this n-type semiconductor. Transistor measurements confirm earlier results from photoemission, suggesting that In4Se3(001) is an n-type semiconductor, so that Schottky barrier formation with a large work function metal, such as Au, is expected. The measured low carrier mobilities could be the result of the contacts and would be consistent with Schottky barrier formation.
机译:使用X射线照相激光谱检查In4Se3(001)的表面终止和该层状三氯化物的界面,与Au,用Au检查。低能量电子衍射表明表面高度结晶,但表明不存在C-2V镜平面对称性。通过角度分辨的X射线照相激光谱发现In4Se3(001)的表面终端,其与具有该n型半导体的观察到的肖特基势垒形成一致。晶体管测量确认了PhotoEmission的早期结果,表明In4Se3(001)是N型半导体,因此预期具有大型工作功能金属的肖特基势垒形成,例如Au。测量的低载波迁移率可能是触点的结果,并且将与肖特基势垒形成一致。

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