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Reduction of thermal disturbances in 3D 1S1R RRAM crossbar arrays for neuromorphic computing

机译:减少用于神经形态计算的3D 1S1R RRAM交叉开关阵列中的热干扰

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Recently, analog behaviors in resistive random-access memory (RRAM) have been proposed as a promising circuit implementation for neuromorphic computing. However, to date, there have been relatively few studies on the issue of resistance degradation (computing weight) induced by thermal disturbances in high-density RRAM arrays. In this paper, thermal simulations of a three-dimensional (3D) one-selector, one-resistor (1S1R) RRAM crossbar array for neuromorphic computing were performed using the COMSOL Multiphysics software. Four factors influencing the thermal disturbance problem were considered: distances between adjacent devices, thermal conductivity of the insulating material, the resistance of the low-resistance state (LRS) of the RRAM, and the programming speed. Thermal disturbances were found to be more severe when the device spacing was less than 200 nm. Higher thermal conductivities of the insulating material, a larger LRS resistance, and a faster operational speed were found to effectively reduce the thermal disturbances in 3D 1S1R RRAM crossbar arrays. The use of sub-nanosecond pulses solved the thermal issues to the greatest extent.
机译:最近,电阻随机存取存储器(RRAM)中的模拟行为已被提出作为一种有前途的神经形态计算电路实现方案。然而,迄今为止,关于由高密度RRAM阵列中的热干扰引起的电阻退化(计算重量)的问题的研究相对较少。在本文中,使用COMSOL Multiphysics软件对用于神经形态计算的三维(3D)单选一电阻(1S1R)RRAM交叉开关阵列进行了热仿真。考虑了影响热干扰问题的四个因素:相邻器件之间的距离,绝缘材料的导热性,RRAM的低电阻状态(LRS)的电阻以及编程速度。当器件间距小于200 nm时,发现热干扰更为严重。发现绝缘材料的较高导热率,较大的LRS电阻和较快的运行速度可有效减少3D 1S1R RRAM交叉开关阵列中的热干扰。亚纳秒脉冲的使用最大程度地解决了热问题。

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