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Thermal crosstalk in 3-dimensional RRAM crossbar array

机译:3维RRAM交叉开关阵列中的热串扰

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摘要

High density 3-dimensional (3D) crossbar resistive random access memory (RRAM) is one of the major focus of the new age technologies. To compete with the ultra-high density NAND and NOR memories, understanding of reliability mechanisms and scaling potential of 3D RRAM crossbar array is needed. Thermal crosstalk is one of the most critical effects that should be considered in 3D crossbar array application. The Joule heat generated inside the RRAM device will determine the switching behavior itself, and for dense memory arrays, the temperature surrounding may lead to a consequent resistance degradation of neighboring devices. In this work, thermal crosstalk effect and scaling potential under thermal effect in 3D RRAM crossbar array are systematically investigated. It is revealed that the reset process is dominated by transient thermal effect in 3D RRAM array. More importantly, thermal crosstalk phenomena could deteriorate device retention performance and even lead to data storage state failure from LRS (low resistance state) to HRS (high resistance state) of the disturbed RRAM cell. In addition, the resistance state degradation will be more serious with continuously scaling down the feature size. Possible methods for alleviating thermal crosstalk effect while further advancing the scaling potential are also provided and verified by numerical simulation.
机译:高密度3维(3D)纵横制电阻式随机存取存储器(RRAM)是新时代技术的主要重点之一。为了与超高密度NAND和NOR存储器竞争,需要了解3D RRAM交叉开关阵列的可靠性机制和扩展潜力。热串扰是3D交叉开关阵列应用中应考虑的最关键的影响之一。 RRAM器件内部产生的焦耳热将决定开关行为本身,对于密集的存储器阵列,周围的温度可能导致相邻器件的电阻降低。在这项工作中,系统地研究了3D RRAM交叉开关阵列中的热串扰效应和热效应下的缩放电位。揭示了复位过程主要由3D RRAM阵列中的瞬态热效应决定。更重要的是,热串扰现象可能会使器件的保持性能下降,甚至导致受干扰的RRAM单元的数据存储状态从LRS(低电阻状态)变为HRS(高电阻状态)。另外,随着不断缩小特征尺寸,电阻状态的恶化将更加严重。还提供了减轻热串扰效应同时进一步提高缩放电位的可能方法,并通过数值模拟进行了验证。

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