首页> 外文期刊>Semiconductor science and technology >Negative capacitance tunneling field effect transistors based on monolayer arsenene, antimonene, and bismuthene
【24h】

Negative capacitance tunneling field effect transistors based on monolayer arsenene, antimonene, and bismuthene

机译:基于单层砷,锑和铋的负电容隧穿场效应晶体管

获取原文
获取原文并翻译 | 示例
       

摘要

Monolayer hexagonal arsenene, antimonene, and bismuthene are emerging two-dimensional (2D) semiconductors. We explore the possibility of their applications on 10 nm gate long tunneling field effect transistors (TFETs) from the ab initio quantum transport simulation. We predict that the ML bismuthene TFET has the largest on-state current Ion (1153 mu A mu m(-1)) among the three checked hexagonal group V-enes ones for high-performance (HP) application. We further propose a prototype negative capacitance TFET, where a ferroelectric dielectric is adopted in the TFET to improve the device performance. The resulting Ion is dramatically elevated to 1868 mu A mu m(-1), which has met the requirement of International Technology Roadmap for Semiconductors for HP devices (1450 mu A mu m(-1)). Therefore, the combination of 2D semiconductor channel and negative capacitance technique breaks the bottleneck of a very low on-state current of conventional TFETs.
机译:单层六角型砷,锑和铋是新兴的二维(2D)半导体。我们从头算量子传输模拟中探索了其在10 nm栅极长隧穿场效应晶体管(TFET)上应用的可能性。我们预测,在用于高性能(HP)应用的三个已检查六角形V型烯中,ML铋TFET具有最大的通态电流离子(1153μAμm(-1))。我们还提出了一种负电容TFET的原型,其中在TFET中采用铁电介质来改善器件性能。所产生的离子显着提高到1868μAμm(-1),已满足HP设备国际半导体技术路线图的要求(1450μAμm(-1))。因此,二维半导体沟道和负电容技术的结合打破了传统TFET的非常低的导通电流的瓶颈。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号