System Provides Non-Invasive, In Situ Metrology

摘要

It is not often high speed, small size, low cost, and high accuracy and precision come together in one in situ metrology box. But if the promise shown by a system developed by a group of MIT engineers is fulfilled, that is what equipment and semiconductor manufacturers may look forward to. Currently under development by Cambridge Metrology (Watertown, Mass.), this photoconductance decay method offers fast and accurate measurements for surface chemistry control in wet and dry environments.