Is ArF the Final Wavelength?

摘要

The lithography prognosticators of the early 1980s declared the end of optics for sub-0.5 μm imaging. However, significant improvements in optics, photoresist and mask technology continued through the mercury lamp lines (436, 405 and 365 nm) and into laser bands of 248 and 193 nm. As each wavelength matured, innovative optical solutions and further improvements in photoresist and process technology have demonstrated that extending imaging resolution is possible, thus further reducing k_1.