Products

摘要

The Gradient Dryer uses the difference between the surface tension of H_2O and alcohol to produce a gradient that generates fast and effective drying of substrates. Surface tension gradient drying yields substrates that are watermark-free with low particle counts. There are no metallic components inside the dryer, therefore charge damage is eliminated. With no moving parts or mechanical stress, the elimination of spin drying reduces wafer breakage. It can process a variety of substrate types and sizes in numerous batch configurations with no post-treatment of effluents.