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Development of an anion imprinted polymer for high and selective removal of arsenite from wastewater

机译:开发用于高选择性去除废水中砷的阴离子印迹聚合物

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A novel cyclic functional monomer (CFM) was used to develop an As(III)-ion imprinted polymer (As-IIP). CFM possesses a positively charged imidazolium moiety and its specific cyclic size matches that of As(III). Batch adsorption experiments showed that the As-IIP has a maximum As(III) adsorption capacity of 55 mg/g, while that of the control polymer (CP) is only 25 mg As(III)/g. Adsorption isotherms for As(III) agree with the Langmuir model, suggesting monolayer adsorption. Kinetic studies showed that the adsorption process followed pseudo-second-order kinetics. The relative selectivity coefficients of As-IIP compared to CP for Cl-/H2AsO3-, SO42-/H2AsO3-, HPO42-/H2AsO3-, NO3-/H2AsO3-, and Mo7O246-/H2AsO3- are 1.03, 1.95, 2.55, 1.52 and 2.51, respectively. The removal efficiency of As-IIP for As(III) in actual industrial wastewater was nearly 100%, which confirms that As-IIP has a high adsorption capacity as well as selectivity for the removal of As(III) from wastewater.
机译:一种新型的环状功能单体(CFM)用于开发As(III)离子印迹聚合物(As-IIP)。 CFM具有带正电的咪唑鎓部分,其特定的环状大小与As(III)的大小相同。分批吸附实验表明,As-IIP的最大As(III)吸附容量为55 mg / g,而对照聚合物(CP)的最大吸附容量仅为25µmg As(III)/ g。 As(III)的吸附等温线与Langmuir模型一致,表明单层吸附。动力学研究表明,吸附过程遵循伪二级动力学。 Cl- / H2AsO3-,SO42- / H2AsO3-,HPO42- / H2AsO3-,NO3- / H2AsO3-和Mo7O246- / H2AsO3-与CP相比,As-IIP的相对选择性系数为1.03、1.95、2.55、1.52和2.51。实际工业废水中As-IIP对As(III)的去除效率接近100%,这表明As-IIP具有很高的吸附能力以及对废水中As(III)去除的选择性。

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