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Cobalt imprinted polymer composition for selective removal of cobalt, process for preparation thereof, and process for removal of cobalt

机译:用于选择性去除钴的钴印聚合物组合物,其制备方法以及去除钴的方法

摘要

The present invention provides a polymer composition for the selective removal of cobalt, a process for the preparation thereof and the process for removal of cobalt, using the said polymer composition. More particularly it relates to a cross-linked polymer composition prepared by the molecular imprinting technique. The preparation of the cross linked polymer involves selection of vinyl monomers bearing functional groups that bind to cobalt, formation of a complex of these monomers with cobalt and subsequent polymerization of the complex in presence of a crosslinker. The process for the removal of cobalt comprises treating the solution containing a mixture of cobalt and other metal ions with the polymer under conditions sufficient for cobalt to form a complex with the polymer and separating the polymer from the cobalt depleted solution.
机译:本发明提供了一种使用所述聚合物组合物的用于选择性除去钴的聚合物组合物,其制备方法以及用于除去钴的方法。更特别地,本发明涉及通过分子印迹技术制备的交联聚合物组合物。交联聚合物的制备涉及选择带有结合到钴上的官能团的乙烯基单体,这些单体与钴的复合物的形成,以及随后在交联剂的存在下该复合物的聚合。除去钴的方法包括在足以使钴与聚合物形成络合物的条件下,用聚合物处理含有钴和其他金属离子的混合物的溶液,并将聚合物与贫钴溶液分离。

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