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Application of Imprinted Functionalized Silica Gel Sorbent for Selective Removal of Cadmium (II) from Industial Wastewaters

机译:印迹功能化硅胶吸附剂在工业废水中选择性去除镉的应用

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This study investigated the application of an ion imprinted polymer (IIP) with (3-mercaptopropyl) trimethoxysilane (MPS) functionalized the surface of silica gel as a potential sorbent (IIP- MPS/SiO2) for the selective removal and recovery of Cd2+ from industrial wastewaters. IIP- MPS/SiO2 was prepared by a sol-gel method and characterized by IR. Batch studies were performed to evaluate the adsorption process and it was found that the sorbents were found to adsorb selectively Cd2+ in the presence of Co2+, Ni2+, Zn2+ and Cu2+ interferences in the same medium. IIP-MPS/SiO2 sorbent show the selectivity order under competitive conditions: Cd2+ > Co2+ > Ni2+ > Zn2+ > Cu2+. The removal rate of IIP- MPS/SiO2 sorbent for Cd2+ was about 80 % from synthetic wastewater and mine wastewater spiked with 10, 20 and 50 mg-L-1 Cd2 +. This work proved that can IIP-MPS/SiO2 sorbent be used as an efficient adsorbent material for selective removal of Cd2+ from wastewaters.
机译:这项研究调查了具有(3-巯基丙基)三甲氧基硅烷(MPS)的离子印迹聚合物(IIP)在硅胶表面上的功能化作为潜在的吸附剂(IIP- MPS / SiO2)的应用,以选择性地从工业中去除和回收Cd2 +废水。通过溶胶-凝胶法制备IIP-MPS / SiO 2并通过IR进行表征。进行了批处理研究以评估吸附过程,发现在相同介质中存在Co2 +,Ni2 +,Zn2 +和Cu2 +干扰物的情况下,吸附剂选择性吸附Cd2 +。 IIP-MPS / SiO2吸附剂在竞争条件下显示出选择性顺序:Cd2 +> Co2 +> Ni2 +> Zn2 +> Cu2 +。从合成废水和掺有10、20和50 mg-L-1 Cd2 +的矿山废水中,IIP- MPS / SiO2吸附剂对Cd2 +的去除率约为80%。这项工作证明IIP-MPS / SiO2吸附剂可以用作从废水中选择性去除Cd2 +的有效吸附剂。

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