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首页> 外文期刊>Romanian journal of information science and technology >High Temperature Compensated Voltage Reference Integrated Circuits on 4H-SiC Material
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High Temperature Compensated Voltage Reference Integrated Circuits on 4H-SiC Material

机译:4H-SiC材料上的高温补偿电压基准集成电路

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This work demonstrates a functional fabricated high temperature compensated Voltage Reference (VR) integrated circuit on 4H-SiC material. The study starts with an experimental analysis on the feasibility on silicon carbide (SiC) of the widely used bandgap reference concept both with Schottky and bipolar diodes. Then an original solution is proposed for a special finger type MESFET. Our approach of the MESFET design overcomes the typical embedded drain leakage of finger type MESFET. This device design was specially developed for using in analog schematics on SiC. Further, an original VR schematic is proposed avoiding the bandgap reference topology and accordingly avoiding an operational amplifier (OpAmp), which is not yet developed on SiC. The performed measurements on the fabricated integrated circuits show a temperature coefficient (TC) comparable to the normal bandgap voltage references on silicon but this SiC circuit is able to work up to 300 degrees C, compared to 125 degrees C for silicon or 200 degrees C for SOI (silicon on insulator). A very important progress of our work is the integration of the presented circuit on the same SiC chip with a power lateral MESFET. Additionally, the circuit contains a linear temperature sensor useful for over temperature protection.
机译:这项工作演示了在4H-SiC材料上制造的功能化高温补偿电压基准(VR)集成电路。该研究从对肖特基和双极二极管广泛使用的带隙参考概念的碳化硅(SiC)可行性进行实验分析开始。然后针对特殊的手指型MESFET提出了一种原始解决方案。我们的MESFET设计方法克服了指型MESFET的典型嵌入式漏极泄漏。该器件设计是专门为在SiC上的模拟原理图中使用而开发的。此外,提出了一种原始的VR原理图,它避免了带隙基准拓扑,从而避免了尚未在SiC上开发的运算放大器(OpAmp)。在制造的集成电路上执行的测量结果显示,温度系数(TC)与硅上的正常带隙电压基准相当,但与硅的125摄氏度或硅的200摄氏度相比,该SiC电路能够工作至300摄氏度。 SOI(绝缘体上的硅)。我们工作的一个非常重要的进展是将所示电路与功率横向MESFET集成在同一SiC芯片上。此外,该电路还包含一个用于过热保护的线性温度传感器。

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