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Note: Electrical resolution during conductive atomic force microscopy measurements under different environmental conditions and contact forces

机译:注意:在不同环境条件和接触力下进行导电原子力显微镜测量时的电分辨率

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摘要

Conductive atomic force microscopy experiments on gate dielectrics in air, nitrogen, and UHV have been compared to evaluate the impact of the environment on topography and electrical measurements. In current images, an increase of the lateral resolution and a reduction of the conductivity were observed in N2 and, especially, in UHV (where current depends also on the contact force). Both effects were related to the reduction/elimination of the water layer between the tip and the sample in N2/UHV. Therefore, since current measurements are very sensitive to environmental conditions, these factors must be taken into consideration when comparisons between several experiments are performed. © 2010 American Institute of Physics
机译:比较了空气,氮气和UHV中栅极电介质的导电原子力显微镜实验,以评估环境对形貌和电学测量的影响。在当前图像中,在N2 中,尤其是在UHV(电流也取决于接触力)中,观察到了横向分辨率的提高和电导率的降低。两种影响都与N2 / UHV中针尖和样品之间水层的减少/消除有关。因此,由于电流测量对环境条件非常敏感,因此在进行几个实验之间的比较时必须考虑这些因素。 ©2010美国物理研究所

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  • 来源
    《Review of Scientific Instruments》 |2010年第10期|p.1-3|共3页
  • 作者单位

    Dept. Enginyeria Electrònica, Universitat Autònoma de Barcelona, Edifici Q, 08193 Bellaterra, Spain;

    Dept. Enginyeria Electrònica, Universitat Autònoma de Barcelona, Edifici Q, 08193 Bellaterra, Spain;

    Dept. Enginyeria Electrònica, Universitat Autònoma de Barcelona, Edifici Q, 08193 Bellaterra, Spain;

    Dept. Enginyeria Electrònica, Universitat Autònoma de Barcelona, Edifici Q, 08193 Bellaterra, Spain;

    The University of Manchester, Sackville Street, Manchester M60 JQD, United Kingdom;

    The University of Manchester, Sackville Street, Manchester M60 JQD, United Kingdom;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    atomic force microscopy; dielectric measurement; electric current measurement;

    机译:原子力显微镜;介电测量;电流测量;

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