This research disclosure relates to a reservoir for storing tin, for example liquid tin, and an associated method for manufacturing the reservoir. The reservoir may be used in an inline refill system for a radiation source. The radiation source may be used in an extreme ultraviolet (EUV) lithographic apparatus. The radiation source may comprise a laser produced plasma (LPP) source. In such an LPP source, a laser system may be arranged to deposit energy via a laser beam into a fuel, such as tin (Sn), which is provided from a fuel emitter. Although tin is referred to in the following description, any suitable fuel may be used. The fuel may for example be in liquid form, and may for example be a metal or alloy. The fuel emitter may comprise a nozzle configured to direct tin, e.g. in the form of droplets, along a trajectory towards a plasma formation region. The deposition of laser energy into the tin creates a tin plasma at the plasma formation region. Radiation, including EUV radiation, is emitted from the plasma during de-excitation and recombination of electrons with ions of the plasma. A continuous supply of the fuel to the fuel emitter may be desirable, e.g. to reduce or prevent downtime of the radiation source. This may improve availability of the radiation source and any associated lithographic system.
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