This research disclosure relates to a gas pressure curtain generation system that may form part of a dynamic gas lock (DGL) system, where the DGL system may form part of a radiation system. The radiation system may be part of a lithographic system. The lithographic system may include a lithographic apparatus. The lithographic apparatus may be, for example, an extreme ultraviolet (EUV) lithographic apparatus. Figure 1 shows a radiation system comprising a DGL. The radiation system comprises a droplet generator that is arranged to produce a stream of fuel droplets, which may be tin fuel droplets, along a fuel droplet trajectory and a laser system that is arranged to produce a laser beam that intersects the fuel droplet trajectory. The laser beam that is incident on the fuel droplets may at least partially convert the droplets into a plasma at a plasma region (also known as a primary focus). The plasma may subsequently emit EUV radiation. This type of radiation source is known as a laser-produced plasma (LPP) source.
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