Research Disclosure

摘要

This research disclosure relates to an apparatus for thermally conditioning an optical component such as a mirror. The apparatus and optical component conditioned thereby may form part of a lithographic apparatus, for example an extreme ultraviolet (EUV) lithographic apparatus. (Photo)lithography is a process of transferring a pattern to a radiation-sensitive substrate by exposing the substrate to radiation having the pattern. The substrate may be a resist-coated silicon wafer. The pattern may be imparted onto a beam of radiation using a reticle. Radiation used in a lithographic apparatus may be extreme ultraviolet (EUV). EUV radiation has a wavelength in the range 4-20 nm, for example 13.5 nm. EUV lithography is used in printing integrated circuits.