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首页> 外文期刊>Proceedings of the IEE - Part B: Radio and Electronic Engineering >An investigation of the current gain of transistors at frequencies up to 105 Mc/s
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An investigation of the current gain of transistors at frequencies up to 105 Mc/s

机译:在高达105 Mc / s的频率下研究晶体管的电流增益

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摘要

Apparatus is described by means of which the short-circuit current gain is measured directly. Results of such measurements are presented for commercial alloy-junction and surface-barrier transistors; corrections are applied to yield the internal diffusion-current gain. The effects of stray capacitances on the measurements are discussed. The cut-off frequency of the internal current gain is compared with values derived indirectly from other measurements. For alloy-junction transistors the behaviour is closely in accord with existing one-dimensional diffusion theory, with some reservations, but for surface-barrier transistors the agreement is less close.
机译:描述了一种设备,通过该设备可以直接测量短路电流增益。给出了商用合金结和表面势垒晶体管的测量结果。进行校正以产生内部扩散电流增益。讨论了杂散电容对测量的影响。将内部电流增益的截止频率与间接从其他测量得出的值进行比较。对于合金结型晶体管,其行为与现有的一维扩散理论非常一致,但有一些保留,但对于表面势垒晶体管,其一致性较差。

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