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首页> 外文期刊>Polymer Degradation and Stability >Stabilization of electronic properties of (IR)-(-)-10-camphorsulfonic acid doped polyaniline by UV irradiation
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Stabilization of electronic properties of (IR)-(-)-10-camphorsulfonic acid doped polyaniline by UV irradiation

机译:紫外辐射稳定(IR)-(-)-10-樟脑磺酸掺杂聚苯胺的电子性能

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Stability of electronic parameters of conducting polymers affects the overall performance of organic electronics. We show that UV light (254 nm) treatment of polyaniline (PANI) films, containing camphorsulfonic acid (CSA) as a dopant and cast from formic acid, decreases the film resistance and keeps their improved resistance stable for at least 4 months. It has been found that due to the different origins of these electronic properties, the resistance and work function of the PANI·CSA films are affected differently by the UV treatment. The long-term stability of the resistance is governed by morphological changes of the material. On the other hand the stability of the threshold voltage of the field-effect transistor (FET) which is an indirect measure of the work function, originates from the charge density equilibration at the PANI·CSA film/ insulator interface. The FT-IR, UV—vis and circular dichroism data provide the evidence that after the UV treatment the polymer molecular structure remains intact, but some secondary structural re-arrangements of the PANI·CSA take place. These re-arrangements are resulting from the strong donor—acceptor interactions between the inline and/or amine groups of the PANI chains and the C=O and SO_3~- groups of the doping CSA-anion. These interactions enhance significantly the mechanical rigidity of the PANI matrix. The increasing broad absorption band of the "free-carrier tail" in the FT-IR spectra correlates with the conductivity increase of the UV treated PANI·CSA film.
机译:导电聚合物电子参数的稳定性会影响有机电子产品的整体性能。我们表明,聚苯胺(PANI)薄膜的紫外线(254 nm)处理,其中包含樟脑磺酸(CSA)作为掺杂剂,并由甲酸铸成,可降低薄膜电阻,并保持至少4个月的稳定电阻稳定性。已经发现由于这些电子特性的不同来源,PANI·CSA膜的电阻和功函数受紫外线处理的影响不同。电阻的长期稳定性取决于材料的形态变化。另一方面,作为功函数的间接度量的场效应晶体管(FET)的阈值电压的稳定性源于PANI·CSA膜/绝缘体界面处的电荷密度平衡。 FT-IR,UV-vis和圆二色性数据提供了证据,表明经过UV处理后,聚合物分子结构保持完整,但PANI·CSA发生了一些二级结构重排。这些重排是由于PANI链的直链和/或胺基与掺杂CSA阴离子的C = O和SO_3-之间的强供体-受体相互作用所致。这些相互作用显着提高了PANI基质的机械刚性。 FT-IR光谱中“自由载流子尾部”的宽吸收带的增加与经紫外线处理的PANI·CSA膜的电导率增加相关。

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