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Morphological and compositional evolution of polymeric colloidal monolayer during UV irradiation

机译:紫外线照射下聚合物胶体单层的形貌和组成演变

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摘要

In this study, we investigated the morphological and compositional evolution polymeric colloidal monolayer during UV irradiation. A PS colloidal monolayer with interparticle bridges was prepared and exposed to the UV light. As a consequence of photochemical reactions containing chain-scission, UV irradiation induced morphological changes in the monolayer surface including changes in the size, shape, and packing structure of PS particles. By manipulating the UV irradiation time, fine tuning of size and shape of the interstice in the monolayer was achieved. In these procedures, the interparticle bridges play an important role. The UV irradiation induced the formation of polar groups in the PS particle surface and thus the particle surface became highly hydrophilic.
机译:在这项研究中,我们调查了紫外线照射期间聚合物胶体单层的形态和组成演变。制备具有颗粒间桥的PS胶体单层并将其暴露于UV光。作为包含断链的光化学反应的结果,紫外线辐射导致单层表面的形态变化,包括PS颗粒的尺寸,形状和堆积结构的变化。通过控制紫外线照射时间,可以实现微调单层空隙的大小和形状。在这些程序中,粒子间桥扮演着重要的角色。紫外线照射导致在PS颗粒表面形成极性基团,因此颗粒表面变得高度亲水。

著录项

  • 来源
    《Polymer Degradation and Stability》 |2013年第9期|1648-1654|共7页
  • 作者单位

    Reliability Assessment Center for Chemical Materials, Korea Research Institute of Chemical Technology (KRICT), 141 Gajeong-ro, Yuseong-gu, Daejeon 305-600, Republic of Korea;

    Reliability Assessment Center for Chemical Materials, Korea Research Institute of Chemical Technology (KRICT), 141 Gajeong-ro, Yuseong-gu, Daejeon 305-600, Republic of Korea;

    Reliability Assessment Center for Chemical Materials, Korea Research Institute of Chemical Technology (KRICT), 141 Gajeong-ro, Yuseong-gu, Daejeon 305-600, Republic of Korea;

    Reliability Assessment Center for Chemical Materials, Korea Research Institute of Chemical Technology (KRICT), 141 Gajeong-ro, Yuseong-gu, Daejeon 305-600, Republic of Korea;

    Reliability Assessment Center for Chemical Materials, Korea Research Institute of Chemical Technology (KRICT), 141 Gajeong-ro, Yuseong-gu, Daejeon 305-600, Republic of Korea;

    Reliability Assessment Center for Chemical Materials, Korea Research Institute of Chemical Technology (KRICT), 141 Gajeong-ro, Yuseong-gu, Daejeon 305-600, Republic of Korea;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Colloidal crystal; Colloidal lithography; Photooxidation; PS latex; Surface characterization;

    机译:胶体晶体;胶体光刻;光氧化;PS乳胶;表面表征;

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