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机译:UVC和405 nm杀菌光源对内窥镜存储的降解作用和安全隐患的比较研究
Department of Biomedical Engineering, University of Strathclyde, Wolfson Centre, 106 Rottenrow, Glasgow, G4 0NW, United Kingdom;
Strathclyde Institute of Pharmacy and Biomedical Sciences (SIPBS), University of Strathclyde, 161 Cathedral Street, Glasgow, G4 0RE, United Kingdom,EPSRC Centre for Innovative Manufacturing in Continuous Manufacturing and Crystallisation (CMAC), University of Strathclyde, Technology and Innovation Centre, 99 George Street, G1 1RD, Glasgow, United Kingdom;
Department of Biomedical Engineering, University of Strathclyde, Wolfson Centre, 106 Rottenrow, Glasgow, G4 0NW, United Kingdom,The Robertson Trust Laboratory for Electronic Sterilisation Technologies, Department of Electronic and Electrical Engineering, University of Strathclyde, 204 George Street, Glasgow, G1 1XW, United Kingdom;
The Robertson Trust Laboratory for Electronic Sterilisation Technologies, Department of Electronic and Electrical Engineering, University of Strathclyde, 204 George Street, Glasgow, G1 1XW, United Kingdom;
The Robertson Trust Laboratory for Electronic Sterilisation Technologies, Department of Electronic and Electrical Engineering, University of Strathclyde, 204 George Street, Glasgow, G1 1XW, United Kingdom;
Department of Biomedical Engineering, University of Strathclyde, Wolfson Centre, 106 Rottenrow, Glasgow, G4 0NW, United Kingdom;
UVC; 405 nm light; Photodegradation; Bacterial adhesion; Endoscope material; Decontamination;
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机译:UVC和405 nm杀菌光源对内窥镜存储的降解作用和安全隐患的比较研究