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首页> 外文期刊>Polymer Degradation and Stability >A comparison study of the degradative effects and safety implications of UVC and 405 nm germicidal light sources for endoscope storage
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A comparison study of the degradative effects and safety implications of UVC and 405 nm germicidal light sources for endoscope storage

机译:UVC和405 nm杀菌光源对内窥镜存储的降解作用和安全隐患的比较研究

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摘要

Storage of flexible endoscopes under germicidal ultraviolet (UVC) light has been associated with degradation of device material leading to failure and increased risk to patients. 405 nm germicidal light presents a possible alternative, potentially providing effective bacterial inactivation without material damage. Samples of endoscope material were exposed to UVC and 405 nm germicidal light sources and a broad spectrum light source control. Material properties were monitored using FTIR, AFM, contact angle and confocal microscopy. Significant changes were observed with samples exposed to the UVC source, with variations in FTIR spectra indicative of side chain scission, a decrease in contact angle from 82.6° to 61.4°, an increase in average surface roughness from 2.34 nm to 68.7 nm and visible cracking of the surface. In contrast samples exposed to the 405 nm light source showed little to no changes, with any variations being comparable to those seen on samples exposed to the broad spectrum control. Bacterial adhesion tests on samples showed an 86.8% increase in Pseudomonas aeruginosa adhesion on UVC exposed samples and no significant increase in adhesion with samples exposed to the other light sources. 405 nm germicidal light therefore potentially represents a safer alternative to UVC light for use in flexible endoscope storage.
机译:柔性内窥镜在杀菌紫外线(UVC)下的存储与设备材料的降解相关,从而导致故障和患者风险的增加。 405 nm杀菌光提供了一种可能的替代方法,可以提供有效的细菌灭活而不会造成物质损坏。内窥镜材料样品暴露于UVC和405 nm杀菌光源以及广谱光源对照下。使用FTIR,AFM,接触角和共聚焦显微镜监测材料性能。暴露于UVC源的样品观察到显着变化,FTIR光谱变化表明侧链断裂,接触角从82.6°减小到61.4°,平均表面粗糙度从2.34 nm增加到68.7 nm,并且可见裂纹表面。相反,暴露于405 nm光源的样品几乎没有变化,甚至没有变化,与暴露于广谱对照样品上的变化相当。对样品的细菌粘附力测试表明,暴露于UVC的样品上的铜绿假单胞菌粘附力增加了86.8%,与暴露于其他光源的样品的粘附力没有明显增加。因此,405 nm杀菌光潜在地代表了用于柔性内窥镜存储的UVC光的更安全替代品。

著录项

  • 来源
    《Polymer Degradation and Stability》 |2016年第11期|249-254|共6页
  • 作者单位

    Department of Biomedical Engineering, University of Strathclyde, Wolfson Centre, 106 Rottenrow, Glasgow, G4 0NW, United Kingdom;

    Strathclyde Institute of Pharmacy and Biomedical Sciences (SIPBS), University of Strathclyde, 161 Cathedral Street, Glasgow, G4 0RE, United Kingdom,EPSRC Centre for Innovative Manufacturing in Continuous Manufacturing and Crystallisation (CMAC), University of Strathclyde, Technology and Innovation Centre, 99 George Street, G1 1RD, Glasgow, United Kingdom;

    Department of Biomedical Engineering, University of Strathclyde, Wolfson Centre, 106 Rottenrow, Glasgow, G4 0NW, United Kingdom,The Robertson Trust Laboratory for Electronic Sterilisation Technologies, Department of Electronic and Electrical Engineering, University of Strathclyde, 204 George Street, Glasgow, G1 1XW, United Kingdom;

    The Robertson Trust Laboratory for Electronic Sterilisation Technologies, Department of Electronic and Electrical Engineering, University of Strathclyde, 204 George Street, Glasgow, G1 1XW, United Kingdom;

    The Robertson Trust Laboratory for Electronic Sterilisation Technologies, Department of Electronic and Electrical Engineering, University of Strathclyde, 204 George Street, Glasgow, G1 1XW, United Kingdom;

    Department of Biomedical Engineering, University of Strathclyde, Wolfson Centre, 106 Rottenrow, Glasgow, G4 0NW, United Kingdom;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    UVC; 405 nm light; Photodegradation; Bacterial adhesion; Endoscope material; Decontamination;

    机译:UVC;405 nm光;光降解;细菌粘附;内窥镜材料去污;

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