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首页> 外文期刊>Plasma Science, IEEE Transactions on >Propagation of a Dielectric Barrier Discharge in a Multichannel Mixing Chip Microreactor
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Propagation of a Dielectric Barrier Discharge in a Multichannel Mixing Chip Microreactor

机译:介质阻挡放电在多通道混合芯片微反应器中的传播

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摘要

An atmospheric-pressure dielectric barrier discharge was generated inside a T-type mixing multichannel chip microreactor in argon, at peak-to-peak voltages of 3.0 kV, and a frequency of 10 kHz. Time-resolved imaging and current-voltage measurements revealed temporal and spatial variation of the discharge, and the appearance of discharge nonuniformities that are considered to arise due to small pressure differences caused by the microchannel geometry, and the mixing of gas flows in regions where the channels connect.
机译:在氩气中的T型混合多通道芯片微反应器内部以3.0 kV的峰峰值电压和10 kHz的频率产生了大气压介电势垒放电。时间分辨成像和电流电压测量显示了放电的时间和空间变化,以及由于微通道几何形状引起的小压力差以及在气体流动的区域内混合气体而引起的放电不均匀现象。通道连接。

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