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首页> 外文期刊>Plasma Science, IEEE Transactions on >Development of High-Performance Cascade Arc Discharge Device for Applications to Plasma Window
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Development of High-Performance Cascade Arc Discharge Device for Applications to Plasma Window

机译:用于等离子窗口的高性能级联电弧放电装置的开发

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摘要

We fabricated a cascade arc discharge source with a channel diameter of 8 mm for application to plasma window as an alternative differential pumping. Helium arc plasmas up to a discharge current of 100 A were generated, and the performance as the plasma window was investigated. The pressure ratio of high-pressure discharge section to low-pressure vacuum side was about 200 at a gas flow rate of 0.05 L/min. In order to characterize the plasma parameters around the anode electrode, vacuum UV and visible emissions of He I were measured. The electron density was determined to be $4 imes 10^{13}$ cm −3 for a discharge current 100 A and a gas flow rate of 0.05 L/min, while the electron temperature was 0.11 eV. Moreover, the forbidden transition of He I 2s 1 S–2p 3 P was observed. The effect of radiation trapping of He I Ly- $lpha $ was studied by the intensity ratio of Ly $lpha $ to forbidden line and the collisional radiative (CR) model. As a result, it was found that the plasma generated was optically thick with an optical escape factor of 10 −5 .
机译:我们制造了一种级联电弧放电源,通道直径为8毫米,用于施加等离子体窗口作为替代差动泵送。产生了100A的放电电流的氦电弧等离子体,并研究了等离子体窗口的性能。低压真空侧的高压排出部分的压力比在0.05L / min的气体流速下为约200。为了表征围绕阳极电极的等离子体参数,测量真空UV和H HE I的可见发射。确定电子密度是<内联公式xmlns:mml =“http://www.w3.org/1998/math/mathml”xmlns:xlink =“http://www.w3.org/1999/xlink “> $ 4 times 10 ^ {13} $ cm -3 用于放电电流100a和0.05 l / min的气体流速,而电子温度为0.11eV。此外,HI I 2S 1 s-2p 3 p被观察到。辐射诱捕的辐射 - <内联公式XMLNS:MML =“http://www.w3.org/1998/math/mathml”xmlns:xlink =“http://www.w3.org/ 1999 / xlink“> $ alpha $ 通过Ly <内联XMLNS的强度比研究了:MML =”http: //www.w3.org/1998/math/mathml“xmlns:xlink =”http://www.w3.org/1999/xlink“> $ Alpha $ 禁止线和碰撞辐射(CR)模型。结果,发现生成的等离子体是光学厚的,具有10 -5

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