Deposition of Plasma-Polymerized 1-Cyanoisoquinoline Thin Films and Their Dielectric Properties

摘要

A novel plasma-polymerized 1-cyanoisoquinoline (PPCIO) thin film of desired thickness was prepared by plasma polymerization under different glow discharge conditions. The effect of the discharge power on the chemical structure, surface composition and morphology of the PPCIO thin films were investigated by Fourier Transform Infrared (FTIR) Spectroscopy, X-ray Photoelectron Spectroscopy (XPS), Atomic Force Microscopy (AFM) and deposition rate measurements. A high retention of the aromatic ring structure of the starting monomer in the deposited plasma films is obtained at a low discharge power of 15 W. The plasma-synthesized films are homogeneous and quite suitable for the measurement of dielectric properties. The dielectric measurements show that a low dielectric constant of 2.62 has been obtained for the PPCIO thin films for the first time.