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首页> 外文期刊>Plasma processes and polymers >Smooth and Self-Similar SiO_2-like Films on Polymers Synthesized in Roll-to-Roll Atmospheric Pressure-PECVD for Gas Diffusion Barrier Applications
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Smooth and Self-Similar SiO_2-like Films on Polymers Synthesized in Roll-to-Roll Atmospheric Pressure-PECVD for Gas Diffusion Barrier Applications

机译:卷对卷大气压-PECVD中合成的聚合物上的光滑且自相似的SiO_2类薄膜,用于气体扩散阻挡层应用

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摘要

SiO_2-like layers deposited by means of the developed atmospheric pressure glow-like DBD assisted CVD technology exhibit remarkable film properties, reported for the first time. The films synthesized in a roll-to-roll mode on polymeric webs, are as smooth as the substrate, irrespectively of the precursors (TEOS or HMDSO) and reactive gases (N_2 or air) employed. Detailed AFMrninvestigation on film morphology, surface roughness and auto correlation length (ξ) show that they are negligibly influenced with thickness and are similar to that of the polymeric substrate, indicating the self-similar growth of the SiO_2-like layers in AP-PECVD. The films are uniform with no defects or particle being incorporated during the deposition process. The produced single layers on polymeric substrate show excellent gas barrier performances towards O_2 and H_2O permeation (OTR: <5 × 10~(-3) cm~3·m~(-2)·day~(-1) and WVTR: <5 × 10~(-3) g·m-~(2)·day~(-1)).
机译:借助已开发的大气压辉光样DBD辅助CVD技术沉积的SiO_2样层具有显着的膜性能,这是首次报道。无论采用哪种前体(TEOS或HMDSO)和反应性气体(N_2或空气),在聚合物网上以卷对卷方式合成的薄膜都与基材一样光滑。 AFMrn对膜形态,表面粗糙度和自相关长度(ξ)进行的详细研究表明,它们对厚度的影响可忽略不计,并且与聚合物基材的厚度相似,表明在AP-PECVD中SiO_2样层的自相似生长。膜是均匀的,在沉积过程中没有缺陷或没有引入颗粒。在聚合物基材上生产的单层对O_2和H_2O的渗透表现出优异的阻气性能(OTR:<5×10〜(-3)cm〜3·m〜(-2)·day〜(-1)和WVTR:< 5×10〜(-3)g·m-〜(2)·天〜(-1))。

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  • 来源
    《Plasma processes and polymers》 |2010年第8期|P.635-639|共5页
  • 作者单位

    Plasma and Materials Processing Group, Department of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, The Netherlands Materials innovation institute (M2i), Mekelweg 2, P.O. Box 2008,2600 CA Delft, The Netherlands;

    rnPlasma and Materials Processing Group, Department of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, The Netherlands Materials innovation institute (M2i), Mekelweg 2, P.O. Box 2008,2600 CA Delft, The Netherlands;

    rnPlasma and Materials Processing Group, Department of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, The Netherlands;

    rnFUJIFILM Manufacturing Europe B.V, P.O. Box 90156, Tilburg, The Netherlands;

    rnFUJIFILM Manufacturing Europe B.V, P.O. Box 90156, Tilburg, The Netherlands;

    rnPhotonics and Semiconductor Nanophysics Group, Department of Applied Physics, Eindhoven University of Technology, P.O. Box 513,5600 MB Eindhoven, The Netherlands;

    rnPlasma and Materials Processing Group, Department of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, The Netherlands;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    atmospheric pressure glow discharges (APGD); films; gas barriers; morphology; organosilicon precursors; roll-to-roll reactors; surface roughness;

    机译:大气压辉光放电(APGD);电影;气体屏障形态学;有机硅前体;卷对卷反应器;表面粗糙度;

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