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Electric gating and interlayer coupling controllable electronic structure and Schottky contact of graphene/BiI_3 van der Waals heterostructure

机译:电动门控和层间耦合可控电子结构和石墨烯/ BII_3 van der Waals异质结构的肖特基接触

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Graphene-based van der Waals heterostructures have received tremendous interest from both fundamental and experimental studies because they can enhance the properties and expand the possibility of applications of both graphene and two-dimensional materials. Motivated by the successful synthesis of the graphene/BiI_3 heterostructure [Chang et al. Adv. Funct. Mater. 28, 1800179 (2018)]., here, we systematically investigate the electronic structure and interfacial characteristics of this material using first-principles simulations. We find that the structure of the graphene/BiI_3 heterostructure is mainly characterized by weak van der Waals interactions, which keeps the heterostructure feasible. In the ground state, the graphene/BiI_3 heterostructure forms the n-type Schottky contact with a barrier of 0.53 eV. The barriers of the Schottky contact can be adjusted by various factors, including interlayer coupling and electric gating. Both the interlayer coupling and electric gating lead to the transformation from the n-type Schottky contact to the n-type one or to the n-type Ohmic contact. These findings demonstrate that graphene/BiI_3 can be considered a promising building block for high-performance photoresponsive optoelectronic devices.
机译:基于石墨烯的VAN DER WAALS异质结构从基本和实验研究中获得了巨大的兴趣,因为它们可以增强性质并扩大石墨烯和二维材料的应用的可能性。通过成功合成石墨烯/ BII_3异质结构的动机[常等。 adv。 funct。母娘。这里,28,1800179(2018)]。在这里,我们系统地研究了使用初始原理模拟的这种材料的电子结构和界面特征。我们发现石墨烯/ BII_3异质结构的结构主要是薄弱的范德华相互作用,这使得异质结构可行。在地状态下,石墨烯/ BII_3异质结构形成与0.53eV的屏障的N型肖特基接触。肖特基接触的屏障可以通过各种因素调节,包括层间耦合和电动栅极。中间层耦合和电栅极均导致从n型肖特基接触到N型或n型欧姆接触的变换。这些发现表明,石墨烯/ BII_3可以被认为是高性能光电子器件的有希望的构建块。

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