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Effects of defects and dephasing on charge and spin currents in two-dimensional topological insulators

机译:二维拓扑绝缘子中缺陷和脱捻电荷的影响

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摘要

Using the nonequilibrium Keldysh Green’s function formalism, we investigate the effect of defects on theelectronic structure and transport properties of two-dimensional topological insulators (TI). We demonstratehow the spatial flow of charge changes between the topologically protected edge and bulk states and showthat elastically and inelastically scattering defects that preserve the time-reversal symmetry of the TI lead toqualitatively different effects on the TI’s local electronic structure and its transport properties. Moreover, weshow that the recently predicted ability to create highly spin-polarized currents by breaking the time-reversalsymmetry of the TI viamagnetic defects [J. S.VanDyke and D. K. Morr, Phys. Rev. B 93, 081401 (2016)] is robustagainst the inclusion of a Rashba spin-orbit interaction and the effects of dephasing, and remains unaffected bychanges over a wide range of the TI’s parameters. We discuss how the sign of the induced spin currents changesunder symmetry operations, such as reversal of bias and gate voltages, or spatial reflections. Finally, we showthat the insight into the interplay between topology and symmetry of the magnetic defects can be employed forthe creation of intriguing quantum phenomena, such as highly localized magnetic fields inside the TI.
机译:使用非Quilibrium keldysh绿色的功能形式主义,我们调查缺陷对的影响二维拓扑绝缘子(TI)的电子结构及其运输特性。我们展示如何在拓扑保护的边缘和散装状态之间改变空间流动变化并显示弹性和含有内侧散射的缺陷,以保持Ti的时间反转对称对TI本地电子结构及其运输特性的定性不同的影响。而且,我们表明最近预测的能力通过破坏时间逆转来创造高旋转极化电流Ti ViaMagentic缺陷的对称性[J. S.Vandyke和D. K. Morr,Phy。 Rev. B 93,081401(2016)]是强大的反对包含Rashba旋转轨道相互作用和去除的影响,并且仍未受到影响在广泛的TI参数上变化。我们讨论了诱导的自旋电流的迹象如何变化在对称性操作下,例如偏置偏置和栅极电压的逆转,或空间反射。最后,我们展示可以采用拓扑和对称性之间的相互作用的洞察,可以使用创建有趣量子现象,例如Ti内的高度局部磁场。

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  • 来源
    《Physical Review. B, Condensed Matter》 |2017年第4期|045151.1-045151.20|共20页
  • 作者

    John S. Van Dyke; Dirk K. Morr;

  • 作者单位

    University of Illinois at Chicago Chicago Illinois 60607 USA;

    University of Illinois at Chicago Chicago Illinois 60607 USA;

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