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Ab initio molecular dynamics calculations of threshold displacement energies in silicon carbide

机译:碳化硅中阈值位移能的从头算分子动力学计算

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Using first-principles molecular dynamics simulations, we have determined the threshold displacement energies and the associated created defects in cubic silicon carbide. We found rather anisotropic values, with an average of 19 eV (38 eV) for the C sublattice (Si sublattice), respectively. Those are close to the experimental consensus, and relaxed configurations are in good agreement with recent works on the stability of point defects in silicon carbide. We carefully investigated the limits of our approach. Our paper shows that displacement energies and associated Frenkel pairs could be determined with first-principles accuracy in silicon carbide, and suggests that it may be also the case for other covalent materials.
机译:使用第一性原理分子动力学模拟,我们确定了立方碳化硅中的阈值位移能和相关的缺陷。我们发现了相当各向异性的值,C子晶格(Si子晶格)的平均值分别为19 eV(38 eV)。这些接近于实验共识,并且松弛的构造与关于碳化硅中的点缺陷的稳定性的最新研究很好地吻合。我们仔细研究了我们方法的局限性。我们的论文表明,位移能和相关的Frenkel对可以用碳化硅的第一性原理确定,并建议其他共价材料也可能如此。

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