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Direct measurements of the spin and valley splittings in the magnetization of a Si/SiGe quantum well in tilted magnetic fields

机译:在倾斜磁场中对Si / SiGe量子阱的磁化强度中的自旋和谷值分裂进行直接测量

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We present de Haas-van Alphen (dHvA) measurements on high-mobility two-dimensional electron systems formed in modulation-doped Si/SiGe (100) quantum wells and demonstrate directly the manifestation of the valley splitting in the magnetization. We resolve sawtoothlike magnetization oscillations at even filling factors which reflect the Landau quantization and the spin splitting of Landau levels in the electronic energy spectrum. At odd filling factors we observe the lifting of the valley degeneracy in Si at high magnetic field. The magnetization is a thermodynamic quantity that at low temperature reflects the ground-state energy of the interacting electron system. We can thus determine quantitatively the energetic splitting of the two occupied conduction-band valleys directly from the oscillation amplitude. Both valley and spin splitting are found to be enhanced by electron-electron interactions. The energy gap due to valley splitting is found to be ≥ 0.8 meV at high perpendicular field B_⊥. From studies in tilted magnetic fields we find that the valley splitting is governed solely by B_⊥. From the spin splitting we recalculate an enhanced g factor g~*=2.9 at v=2 including the influence of disorder. This is significantly larger than the band-structure g factor of 2 in Si. We have successfully applied the coincidence technique for the dHvA effect and thus obtained a complementary means to determine the g factor. It yields a constant value g~* ≈ 3.2 for filling factors v ≥ 10. A detailed analysis of the magnetization traces enabled us also to determine quantitatively the residual level broadening Γ in this high-mobility Si/SiGe system. We obtain a small value of Γ=0.15 meV X B_⊥ [T]~(1/2) for the Si/SiGe heterostructure of 200 000 cm~2/(V s) mobility at 0.3 K.
机译:我们目前在调制掺杂的Si / SiGe(100)量子阱中形成的高迁移率二维电子系统上的de Haas-van Alphen(dHvA)测量,并直接证明了磁化过程中谷裂的表现。我们解决了均匀填充因子下的锯齿状磁化振荡,这反映了朗道量化和朗道能级在电子能谱中的自旋分裂。在奇数填充因子下,我们观察到在高磁场下硅中谷的简并性上升。磁化强度是一个热力学量,在低温下反映了相互作用的电子系统的基态能量。因此,我们可以直接从振荡幅度定量地确定两个占据的导带谷的能量分裂。发现谷和自旋分裂都通过电子-电子相互作用而增强。发现在高垂直场B_ found下,由于谷裂造成的能隙≥0.8 meV。通过对倾斜磁场的研究,我们发现谷值分裂仅由B_⊥控制。根据自旋分裂,我们重新计算了增强的g因子g〜* = 2.9(在v = 2时),其中包括无序的影响。这明显大于Si中2的能带结构g因子。我们已经成功地将巧合技术应用于dHvA效应,因此获得了确定g因子的补充手段。对于填充因子v≥10,它产生一个恒定值g〜*≈3.2。对磁化迹线的详细分析使我们也能够定量确定这种高迁移率Si / SiGe系统中剩余能级展宽Γ。对于在0.3 K下200,000 cm〜2 /(V s)迁移率的Si / SiGe异质结构,我们获得了一个小的Γ= 0.15 meV XB_⊥[T]〜(1/2)。

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