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首页> 外文期刊>Physical review. B, Condensed Matter And Materials Physics >Band structure of indium oxide: Indirect versus direct band gap
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Band structure of indium oxide: Indirect versus direct band gap

机译:氧化铟的能带结构:间接带隙与直接带隙

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The nature of the band gap of indium oxide is still a matter of debate. Based on optical measurements the presence of an indirect band gap has been suggested, which is 0.9 to 1.1 eV smaller than the direct band gap at the Γ point. This could be caused by strong mixing of O 2p and In 4d orbitals off Γ. We have performed extensive density functional theory calculations using the LDA+ U and the GGA+U methods to elucidate the contribution of the In 4d states and the effect of spin-orbit coupling on the valence band structure. Although an indirect band gap is obtained, the energy difference between the overall valence band maximum and the highest occupied level at the Γ point is less than 50 meV. It is concluded that the experimental observation cannot be related to the electronic structure of the defect free bulk material.
机译:氧化铟带隙的性质仍是一个有争议的问题。根据光学测量,已经提出了间接带隙的存在,该间接带隙比Γ点处的直接带隙小0.9至1.1 eV。这可能是由于O 2p和In的In 4d轨道强烈混合造成的。我们已经使用LDA + U和GGA + U方法进行了广泛的密度泛函理论计算,以阐明In 4d态的贡献以及自旋轨道耦合对价带结构的影响。尽管获得了间接带隙,但是在价点处的总价带最大值与最高占据能级之间的能量差小于50 meV。结论是,实验观察结果与无缺陷散装材料的电子结构无关。

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