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First-principles Study Of Electronic Properties Of Biaxially Strained Silicon: Effects On Charge Carrier Mobility

机译:双轴应变硅电子性质的第一性原理研究:对电荷载流子迁移率的影响

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摘要

Using first-principles method, we calculate the electronic band structure of biaxially strained silicon, from which we analyze the change in electron and hole effective mass as a function of strain and determine the mobility of electrons and holes in the biaxially strained silicon based on Boltzmann transport theory. We found that electron mobility increases with tensile strain and decreases with compressive strain. Such changes are mainly caused by a strain-induced change in electron effective mass, while the suppression of intervalley scattering plays a minor role. On the other hand, the hole mobility increases with both signs of strain and the effect is more significant for compressive strain because the hole effective mass decreases with compressive strain but increases with tensile strain. The strain-induced suppression of interband and intraband scatterings plays also an important role in changing the hole mobility.
机译:使用第一原理方法,我们计算了双轴应变硅的电子能带结构,从中我们分析了电子和空穴有效质量随应变的变化,并基于玻耳兹曼确定了双轴应变硅中电子和空穴的迁移率运输理论。我们发现电子迁移率随拉伸应变而增加,而随压缩应变而降低。这种变化主要是由应变引起的电子有效质量的变化引起的,而抑制区间间隔散射的作用较小。另一方面,空穴的迁移率随应变的两种迹象而增加,并且对于压缩应变的影响更为显着,因为空穴的有效质量随压缩应变而减小,而随拉伸应变而增大。带间和带内散射的应变诱导抑制在改变空穴迁移率中也起着重要作用。

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