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X-ray dynamical diffraction from multilayer Laue lenses with rough interfaces

机译:具有粗糙界面的多层Laue透镜的X射线动态衍射

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A modeling approach for x-ray dynamical diffraction from multilayer Laue lenses (MLLs) with rough interfaces is developed. Although still based on the principle of the distorted-wave Born approximation (DWBA), this model is formulated from the perspective of the physical scattering process, very different from the conventional DWBA formalism. Using this model, one can study x-ray scattering from rough interfaces in the regime of Fresnel diffraction and in the case of absorptive samples, for example, x-ray dynamical diffraction from MLLs with rough interfaces, which is hard to handle in the framework of the conventional DWBA. Theoretical simulations for various MLLs with rough interfaces are conducted. It is found that interfacial roughness results in a decrease in the local diffraction intensity, where the attenuation factor is a function of the root-mean-square (rms) roughness versus the local zone width ratio. This study shows that if all zones possess an identical rms roughness value that is less than half of the outmost MLL zone width, the focal broadening effect due to roughness is almost unnoticeable, provided that the mean position of the interface does not deviate from the required zone plate law. A further study shows that uncorrelated interfacial roughness can be treated the same as interfacial diffusion, in which case a roughness factor similar to the "Debye-Waller factor" can be used, and the pseudo-Fourier coefficients of the susceptibility function for an MLL [H. F. Yan et al., Phys. Rev. B 76, 115438 (2007)] have to be multiplied by this factor.
机译:建立了具有粗糙界面的多层Laue透镜(MLL)的X射线动态衍射的建模方法。尽管仍然基于失真波博恩近似(DWBA)的原理,但是该模型是从物理散射过程的角度来构造的,与常规DWBA形式主义有很大不同。使用该模型,可以研究菲涅耳衍射中粗糙界面的X射线散射,对于吸收性样品,例如,具有粗糙界面的MLL的X射线动态衍射,这在框架中很难处理。常规DWBA。进行了具有粗糙界面的各种MLL的理论仿真。发现界面粗糙度导致局部衍射强度降低,其中衰减因子是均方根(rms)粗糙度与局部区域宽度比的函数。这项研究表明,如果所有区域都具有相同的均方根粗糙度值,且小于最大MLL区域宽度的一半,则只要界面的平均位置不偏离所需的粗糙度,由于粗糙度引起的焦斑扩展效果几乎就不会引起注意。区域板法。进一步的研究表明,可以将不相关的界面粗糙度与界面扩散视为相同,在这种情况下,可以使用类似于“ Debye-Waller因子”的粗糙度系数,并且对于MLL的磁化率函数的拟傅里叶系数[ H。 F.Yan等人,《物理学报》。修订版B 76,115438(2007)]必须乘以该系数。

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