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机译:钨在电子发射阴极上钡-dium-氧涂层的从头算研究
Interdisciplinary Materials Science Program, University of Wisconsin-Madison, 1509 University Avenue, Madison, Wisconsin 53706, USA L-3 Communications-Electron Devices Division, 960 Industrial Rd., San Carlos, CA 94070, USA;
Interdisciplinary Materials Science Program, University of Wisconsin-Madison, 1509 University Avenue, Madison, Wisconsin 53706, USA Department of Electrical and Computer Engineering, University of Wisconsin-Madison, 1415 Engineering Drive, Madison, Wisconsin 53706, USA;
Interdisciplinary Materials Science Program, University of Wisconsin-Madison, 1509 University Avenue, Madison, Wisconsin 53706, USA Department of Materials Science and Engineering, University of Wisconsin-Madison, 1509 University Avenue, Madison, Wisconsin 53706, USA;
density functional theory, local density approximation, gradient and other corrections; thermionic emission; surface double layers, schottky barriers, and work functions; surface states, band structure, electron density of states;
机译:电子奥氏光谱法研究钨涂层和钠钨青铜
机译:通过电子螺旋谱检查钨涂层和钠钨铜的研究
机译:从头开始研究二氧化钨的结构和电子性能
机译:使用Ab-initio建模对由于薄表面涂层导致的阴极材料功函数的修改提供新见解
机译:浸渍热阴极的电子和位阻性质:朝着“从头开始”的阴极体系结构的科学基础的发展。
机译:生长后电老化制备稳定的碳纳米管冷阴极电子发射体
机译:依赖于工艺和流动的薄膜沉积高压阴极气流溅射在钛和钨涂层上