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Process- and flow-dependent film deposition of hollow cathode gas flow sputtering investigated on titanium and tungsten coatings

机译：依赖于工艺和流动的薄膜沉积高压阴极气流溅射在钛和钨涂层上

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Tang Stanley;
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1. Comparison between conventional and hollow cathode magnetron sputtering systems on the growing of titanium dioxide thin films: A correlation between the gas discharge and film formation [J] . Duarte D.A., Massi M., Da Silva Sobrinho A.S. The European physical journal. Applied physics . 2011,第2期

机译：传统和空心阴极磁控溅射系统在二氧化钛薄膜生长上的比较：气体排放与成膜之间的关系
2. Titanium and titanium nitride thin films grown by dc reactive magnetron sputtering Physical Vapor Deposition in a continuous mode on stainless steel wires: Chemical, morphological and structural investigations [J] . Grosso S., Latu-Romain L., Berthome G., Surface & Coatings Technology . 2017,第期

机译：通过DC反应磁控溅射物理气相沉积在不锈钢线上的连续模式下，钛和氮化钛薄膜在不锈钢线上的连续方式：化学，形态学和结构研究
3. Electrical And Optical Properties Of Al-doped Zno Films Deposited By Hollow Cathode Gas Flow Sputtering [J] . Hiroshi Takeda, Yasushi Sato, Yoshinori Iwabuchi, Thin Solid Films . 2009,第10期

机译：空心阴极气流溅射沉积Al掺杂Zno薄膜的电学和光学性质
4. Investigations of a Cavity-Hollow Cathode Sputtering Source for Titanium Thin Films [C] . C. Ionita, R. Schrittwieser, A. Murawski, Conference on Plasma Physics . 2010

机译：用于钛薄膜腔 - 空心阴极溅射源的研究
5. Preparation and nitrobenzene reaction kinetics of microcrystalline tungsten bronze thin films with or without transition metal (silver, titanium, chromium, manganese, iron, cobalt, nickel and copper) coatings. [D] . Khan, Kashif Rashid. 2006

机译：具有或不具有过渡金属（银，钛，铬，锰，铁，钴，镍和铜）涂层的微晶钨青铜薄膜的制备及其硝基苯反应动力学。
6. Investigation of Antireflection Nb2O5 Thin Films by the Sputtering Method under Different Deposition Parameters [O] . Kun-Neng Chen, Chao-Ming Hsu, Jing Liu, 2016

机译：不同沉积参数下溅射法制备Nb2O5减反射薄膜的研究
7. The influence of pressure and gas flow on size and morphology of titanium oxide nanoparticles synthesized by hollow cathode sputtering [O] . Gunnarsson, Rickard, Pilch, Iris, Boyd, Robert, 2016

机译：压力和气体流量对空心阴极溅射合成二氧化钛纳米粒子尺寸和形貌的影响

Process- and flow-dependent film deposition of hollow cathode gas flow sputtering investigated on titanium and tungsten coatings

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