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Cooling dynamics of photoexcited carriers in Si studied using optical pump and terahertz probe spectroscopy

机译:用光泵和太赫兹探针光谱研究硅中光激发载流子的冷却动力学

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We investigated the photoexcited carrier dynamics in Si by using optical pump and terahertz probe spectroscopy in an energy range between 2 and 25 meV. The formation dynamics of excitons from unbound e-h pairs was studied through the emergence of the 1s-2p transition of excitons at 12 meV (3 THz). We revealed the thermalization mechanism of the photoinjected hot carriers (electrons and holes) in the low-temperature lattice system by taking account of the interband and intraband scattering of carriers with acoustic and optical phonons. The overall cooling rate of electrons and holes was numerically calculated on the basis of a microscopic analysis of the phonon scattering processes, and the results well account for the experimentally observed carrier cooling dynamics. The long formation time of excitons in Si after the above-gap photoexcitation is reasonably accounted for by the thermalization process of photoexcited carriers.
机译:我们通过使用光泵和太赫兹探针光谱在2至25 meV之间的能量范围研究了Si中的光激发载流子动力学。通过在12 meV(3 THz)下出现激子的1s-2p跃迁来研究未结合e-h对中激子的形成动力学。通过考虑载流子与声子和光子的带间和带内散射,我们揭示了低温晶格系统中光注入热载流子(电子和空穴)的热化机理。电子和空穴的总体冷却速率是在对声子散射过程进行微观分析的基础上进行数值计算的,其结果很好地说明了实验观察到的载流子冷却动力学。在上述间隙的光激发之后,硅中激子的长形成时间是由光激发载体的热化过程合理地解释的。

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