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Surface photovoltage effect at the p-WSe_2:Rb surface: Photoemission experiment and numerical model

机译:p-WSe_2:Rb表面的表面光电压效应:光发射实验和数值模型

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It is shown that a combined experimental and theoretical study of the surface photovoltage (SPV) effect can be utilized for the quantification of a number of material parameters in a semiconductor-adsorbate model system. At the Rb-adsorbed surface of the semiconducting layered transition metal dichalcogenide WSe_2, a large SPV effect of ≈600 meV is observed already at a moderate photon flux. Using valence band PES and an auxiliary tunable light source, the surface potential and the SPV effect are traced as a function of the adsorbate density and absorbed light intensity. We find that a major part of the stationary band back bending as a function of photon flux is constrained to a highly sensitive region, that is, a large fraction (50%-80%) of the total SPV magnitude rises within less than 1 order of magnitude. The effect is reproduced by a numerical model involving semiclassical charge carrier dynamics in the surface space charge layer. Among the parameters determined from the simulation, we find an approximate bulk acceptor density between 0.9 × 10~(17) and 2 × 10~(17) cm~(-3), a broad distribution of adsorbate donor levels at ≈0.2 eV above the conduction band minimum, and electron and hole carrier mobilities μ_e = 0.7 cm~2/(V s), μ_h = 1.5 cm~2/(V s) in the crystallographic c direction.
机译:结果表明,表面光电压(SPV)效应的组合实验和理论研究可用于量化半导体吸附剂模型系统中许多材料参数。在半导体层状过渡金属二卤化钨WSe_2的Rb吸附表面,在中等光子通量下已经观察到约600 meV的大SPV效应。使用价带PES和辅助可调光源,可以根据被吸附物密度和吸收光强度来跟踪表面电势和SPV效应。我们发现,作为光子通量的函数,稳态带回弯曲的主要部分被限制在一个高度敏感的区域,也就是说,总SPV大小的很大一部分(50%-80%)在不到1个数量级内上升数量级。通过涉及表面空间电荷层中半经典电荷载流子动力学的数值模型来再现该效应。通过模拟确定的参数中,我们发现在0.9×10〜(17)和2×10〜(17)cm〜(-3)之间的近似本体受体密度,在高于≈0.2 eV时吸附剂供体能级分布较宽导带最小值,以及电子和空穴载流子迁移率μ_e= 0.7 cm〜2 /(V s),μ_h= 1.5 cm〜2 /(V s)。

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