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Efros-Shklovskii variable-range hopping in reduced graphene oxide sheets of varying carbon sp~2 fraction

机译:碳sp〜2分数变化的氧化石墨烯片中的Efros-Shklovskii变程跳跃

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摘要

We investigate the low-temperature electron transport properties of chemically reduced graphene oxide (RGO) sheets with different carbon sp~2 fractions of 55% to 80%. We show that in the low-bias (Ohmic) regime, the temperature (T) dependent resistance (R) of all the devices follow Efros-Shklovskii variable range hopping (ES-VRH) R ~ exp[(T_(ES)/T)~(1/2)] with (T_(ES) decreasing from 3.1 × 10~4 to 0.42 × 10~4 K and electron localization length increasing from 0.46 to 3.21 nm with increasing sp~2 fraction. From our data, we predict that for the temperature range used in our study, Mott-VRH may not be observed even at 100% sp~2 fraction samples due to residual topological defects and structural disorders. From the localization length, we calculate a band-gap variation of our RGO from 1.43 to 0.21 eV with increasing sp~2 fraction from 55 to 80%, which agrees remarkably well with theoretical predictions. We also show that, in the high bias non-Ohmic regime at low temperature, the hopping is field driven and the data follow R ~ exp[(E_0/E)~(1/2)] providing further evidence of ES-VRH.
机译:我们研究了化学还原氧化石墨烯(RGO)片材的不同电子sp〜2分数为55%至80%的低温电子传输性能。我们表明,在低偏置(欧姆)状态下,所有器件的温度(T)相关电阻(R)均遵循Efros-Shklovskii可变范围跳跃(ES-VRH)R〜exp [(T_(ES)/ T )〜(1/2)],其中(T_(ES)从3.1×10〜4减小到0.42×10〜4 K,电子本地化长度从0.46到3.21 nm随着sp〜2分数的增加而增加。预测在我们研究中使用的温度范围内,由于残留的拓扑缺陷和结构紊乱,即使在100%sp〜2分数的样品中也可能未观察到Mott-VRH。从定位长度,我们计算出我们的带隙变化RGO从1.43 eV到0.21 eV,sp〜2分数从55%增加到80%,这与理论预测非常吻合;我们还表明,在低温下的高偏置非欧姆状态下,跳变是由场驱动的,并且数据遵循R〜exp [(E_0 / E)〜(1/2)],为ES-VRH提供了进一步的证据。

著录项

  • 来源
    《Physical review》 |2012年第23期|235423.1-235423.8|共8页
  • 作者单位

    Nanoscience Technology Center, University of Central Florida, Orlando, Florida 32826, USA,Department of Physics, University of Central Florida, Orlando, Florida 32826, USA;

    Nanoscience Technology Center, University of Central Florida, Orlando, Florida 32826, USA,Department of Physics, University of Central Florida, Orlando, Florida 32826, USA,School of Electrical Engineering and Computer Science, University of Central Florida, Orlando, Florida-32826, USA;

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  • 正文语种 eng
  • 中图分类
  • 关键词

    mobility edges; hopping transport; electronic transport in nanoscale materials and structures;

    机译:流动性边缘;跳车运输;纳米级材料和结构中的电子传输;

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