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Highly ordered nanoscale patterns produced by masked ion bombardment of a moving solid surface

机译:通过掩蔽离子轰击移动的固体表面产生的高度有序的纳米级图案

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摘要

We introduce a fabrication method in which a mask with a long, narrow slit is placed between the source of an ion beam and the surface of a solid moving with constant speed. Numerical simulations reveal the method can generate surface ripples and arrays of nanoholes that are virtually defect free. In contrast, the patterns produced by ion bombardment with a broad, unmasked beam are typically rife with defects.
机译:我们介绍一种制造方法,其中在离子束源和以恒定速度移动的固体表面之间放置具有狭长狭缝的掩模。数值模拟表明,该方法可以产生几乎没有缺陷的表面波纹和纳米孔阵列。相反,通过用宽阔的未掩盖束进行离子轰击产生的图案通常充满缺陷。

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