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首页> 外文期刊>Physical review >High-pressure optical absorption in InN: Electron density dependence in the wurtzite phase and reevaluation of the indirect band gap of rocksalt InN
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High-pressure optical absorption in InN: Electron density dependence in the wurtzite phase and reevaluation of the indirect band gap of rocksalt InN

机译:InN的高压光吸收:纤锌矿相中电子密度的依赖性和岩盐InN间接带隙的重新评估

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摘要

We report on high-pressure optical absorption measurements on InN epilayers with a range of free-electron concentrations (5 × 10~(17)—1.6 × 10~(19) cm~(-3)) to investigate the effect of free carriers on the pressure coefficient of the optical band gap of wurtzite InN. With increasing carrier concentration, we observe a decrease of the absolute value of the optical band gap pressure coefficient of wurtzite InN. An analysis of our data based on the k-p model allows us to obtain a pressure coefficient of 32 meV/GPa for the fundamental band gap of intrinsic wurtzite InN. Optical absorption measurements on a 5.7-μm-thick InN epilayer at pressures above the wurtzite-to-rocksalt transition have allowed us to obtain an accurate determination of the indirect band gap energy of rocksalt InN as a function of pressure. Around the phase transition (~15 GPa), a band gap value of 0.7 eV and a pressure coefficient of ~23 meV/GPa are obtained.
机译:我们报告了在InN外延层上具有一系列自由电子浓度(5×10〜(17)—1.6×10〜(19)cm〜(-3))的高压光吸收测量,以研究自由载流子的影响纤锌矿InN的光学带隙的压力系数随着载流子浓度的增加,我们观察到纤锌矿InN的光学带隙压力系数的绝对值减小。基于k-p模型的数据分析使我们能够获得32 mV / GPa的固有纤锌矿InN基带隙压力系数。在高于纤锌矿到岩盐转变的压力下,在厚度为5.7μm的InN外延层上进行的光吸收测量使我们能够准确确定岩盐InN的间接带隙能量随压力的变化。在相变(〜15 GPa)附近,带隙值为0.7 eV,压力系数为〜23 meV / GPa。

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  • 来源
    《Physical review 》 |2012年第3期| p.035210.1-035210.5| 共5页
  • 作者单位

    Institut Jaume Almera, Consell Superior d'Investigations Cientifiques (CSIC), 08028 Barcelona, Catalonia, Spain;

    Departament de Fisica Aplicada-ICMUV-MALTA Consolider Team, Universitat de Valencia, 46100 Burjassot (Valencia), Spain;

    Departament de Fisica Aplicada-ICMUV-MALTA Consolider Team, Universitat de Valencia, 46100 Burjassot (Valencia), Spain;

    Institut Jaume Almera, Consell Superior d'Investigations Cientifiques (CSIC), 08028 Barcelona, Catalonia, Spain;

    Instituto de Disenopara la Fabrication y Production Automatizada, MALTA Consolider Team-Universitat Politecnica de Valencia,46022 Valencia, Spain;

    Faculty of Science and Engineering, Ritsumeikan University, Shiga 525-8577, Japan;

    Faculty of Science and Engineering, Ritsumeikan University, Shiga 525-8577, Japan;

    Institut Jaume Almera, Consell Superior d'Investigations Cientifiques (CSIC), 08028 Barcelona, Catalonia, Spain;

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  • 正文语种 eng
  • 中图分类
  • 关键词

    Ⅱ-Ⅵ semiconductors; semiconductors; semiconductor compounds;

    机译:Ⅱ-Ⅵ半导体;半导体;半导体化合物;

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