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首页> 外文期刊>Physical review >Systematic study of structural, electronic, and optical properties of atomic-scale defects in the two-dimensional transition metal dichalcogenides MX_2 (M = Mo, W; X = S, Se, Te)
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Systematic study of structural, electronic, and optical properties of atomic-scale defects in the two-dimensional transition metal dichalcogenides MX_2 (M = Mo, W; X = S, Se, Te)

机译:系统研究二维过渡金属二卤化金属MX_2(M = Mo,W; X = S,Se,Te)中原子尺度缺陷的结构,电子和光学性质

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In this work, we have systematically studied structural, electronic, and magnetic properties of atomic-scale defects in 2D transition metal dichalcogenides MX_2 (M = Mo and W; X = S, Se, and Te) by density functional theory. Various types of defects, e.g., X vacancy, X interstitial, M vacancy, M interstitial, and MX and XX double vacancies, have been considered. It has been found that the X interstitial has the lowest formation energy (~1 eV) for all the systems in the X-rich condition, whereas for the M-rich condition, X vacancy has the lowest formation energy except for MTe_2 systems. Both these defects have very high equilibrium defect concentrations at growth temperatures (1000-1200 K) reported in literature. A pair of defects, e.g., two X vacancies or one M and one X vacancies, tend to occupy the nearest possible distance. No trace of magnetism has been found for any one of the defects considered. Apart from X interstitial, all other defects have defect states appearing in the band gap, which can greatly affect the electronic and optical properties of the pristine systems. Our calculated optical properties show that the defect states cause optical transitions at ~ 1.0 eV, which can be beneficial for light emitting devices. The results of our systematic study are expected to guide the experimental nanoengineering of defects to achieve suitable properties related to band gap modifications and characterization of defect fingerprints via optical absorption measurements.
机译:在这项工作中,我们通过密度泛函理论系统地研究了二维过渡金属二卤化金属MX_2(M = Mo和W; X = S,Se和Te)中原子尺度缺陷的结构,电子和磁性。已经考虑了各种类型的缺陷,例如,X空位,X间隙,M空位,M间隙以及MX和XX双重空位。已经发现,在富含X的条件下,对于所有系统,X间隙的形成能最低(〜1 eV),而对于富含M的条件,除MTe_2系统以外,X空位的形成能最低。这两种缺陷在文献报道的生长温度(1000-1200 K)下都具有很高的平衡缺陷浓度。一对缺陷,例如两个X空位或一个M和一个X空位,倾向于占据最近的可能距离。对于所考虑的任何一种缺陷都没有发现磁性痕迹。除X填隙外,所有其他缺陷在带隙中均出现缺陷状态,这会极大地影响原始系统的电子和光学性能。我们计算出的光学性质表明,缺陷状态会导致在〜1.0 eV处发生光学跃迁,这可能对发光器件有利。我们的系统研究结果有望指导缺陷的纳米工程实验,以实现与带隙修饰和通过光吸收测量表征缺陷指纹有关的合适性能。

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