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首页> 外文期刊>Physical review >Electrical transport limited by electron-phonon coupling from Boltzmann transport equation: An ab initio study of Si, Al, and MoS_2
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Electrical transport limited by electron-phonon coupling from Boltzmann transport equation: An ab initio study of Si, Al, and MoS_2

机译:电传输受玻尔兹曼传输方程的电子-声子耦合限制:Si,Al和MoS_2的从头算研究

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We demonstrate the ab initio electrical transport calculation limited by electron-phonon coupling by using the full solution of the Boltzmann transport equation (BTE), which applies equally to metals and semiconductors. Numerical issues are emphasized in this work. We show that the simple linear interpolation of the electron-phonon coupling matrix elements from a relatively coarse grid to an extremely fine grid can ease the calculational burden, which makes the calculation feasible in practice. For the Brillouin zone (BZ) integration of the transition probabilities involving one 8 function, the Gaussian smearing method with a physical choice of locally adaptive broadening parameters is employed. We validate the calculation in the cases of n-type Si and Al. The calculated conductivity and mobility are in good agreement with experiments. In the metal case we also demonstrate that the Gaussian smearing method with locally adaptive broadening parameters works excellently for the BZ integration with double S functions involved in the Eliashberg spectral function and its transport variant. The simpler implementation is the advantage of the Gaussian smearing method over the tetrahedron method. The accuracy of the relaxation time approximation and the approximation made by Allen [Phys. Rev. B 17, 3725 (1978)] has been examined by comparing with the exact solution of BTE. We also apply our method to n-type monolayer MoS_2, for which a mobility of 150 cm~2 v~(-1) s~(-1) is obtained at room temperature. Moreover, the mean free paths are less than 9 nm, indicating that in the presence of grain boundaries the mobilities should not be effectively affected if the grain boundary size is tens of nanometers or larger. The ab initio approach demonstrated in this paper can be directly applied to other materials without the need for any a priori knowledge about the electron-phonon scattering processes, and can be straightforwardly extended to study cases with electron-impurity scattering.
机译:我们通过使用玻尔兹曼输运方程(BTE)的完整解证明了受电子-声子耦合限制的从头算起的电输运计算,该方程同样适用于金属和半导体。这项工作强调了数值问题。我们表明,电子-声子耦合矩阵元素从相对粗糙的网格到极细的网格的简单线性插值可以减轻计算负担,从而使计算在实践中可行。对于涉及一个8函数的跃迁概率的布里渊区(BZ)积分,采用具有局部自适应加宽参数的物理选择的高斯涂抹方法。我们在n型Si和Al的情况下验证了该计算。计算出的电导率和迁移率与实验吻合良好。在金属情况下,我们还证明了具有局部自适应加宽参数的高斯拖尾方法对于Eliashberg光谱函数及其输运变体中涉及的具有双S函数的BZ积分非常有效。较简单的实现是高斯涂抹方法优于四面体方法的优势。弛豫时间近似值的精确度和Allen [Phys。通过与BTE的精确解决方案进行比较,研究了B. 17,3725(1978)版。我们还将我们的方法应用于n型单层MoS_2,其在室温下的迁移率为150 cm〜2 v〜(-1)s〜(-1)。此外,平均自由程小于9nm,表明在存在晶界的情况下,如果晶界尺寸为数十纳米或更大,则迁移率不应受到有效影响。本文演示的从头算方法可以直接应用于其他材料,而无需任何有关电子-声子散射过程的先验知识,并且可以直接扩展到研究电子杂质散射的情况。

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