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Near-field thermal radiation between doped silicon plates at nanoscale gaps

机译:纳米级间隙的掺杂硅板之间的近场热辐射

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摘要

Radiative heat transfer can be significantly enhanced via photon tunneling through a nanometer-scale gap to the point that it exceeds the blackbody limit. Here we report quantitative measurements of the near-field thermal radiation between doped-Si plates (width = 480 μm and length = 1.34 cm). A novel MEMS-based platform enables us to maintain doped-Si plates at nanoscale gap distances that cannot be achieved by other methods. The measured radiative heat transfer coefficient was found to be 2.91 times greater than the blackbody limit at a 400-nm vacuum gap.
机译:辐射传热可以通过光子隧穿穿过纳米级间隙达到超过黑体极限的程度而得到显着增强。在这里,我们报告了掺杂Si板(宽度= 480μm,长度= 1.34 cm)之间近场热辐射的定量测量。一个新颖的基于MEMS的平台使我们能够将掺杂硅板保持在纳米级间隙距离,而这是其他方法无法实现的。发现在400 nm的真空间隙下,测得的辐射传热系数是黑体极限的2.91倍。

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