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首页> 外文期刊>Physical review. B, Condensed Matter And Materals Physics >Dynamics of exciton recombination in strong magnetic fields in ultrathin GaAs/AlAs quantum wells with indirect band gap and type-Ⅱ band alignment
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Dynamics of exciton recombination in strong magnetic fields in ultrathin GaAs/AlAs quantum wells with indirect band gap and type-Ⅱ band alignment

机译:间接带隙和Ⅱ型能带对准的超薄GaAs / AlAs量子阱中强磁场中激子复合的动力学

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摘要

The exciton recombination dynamics is studied experimentally and theoretically in two-monolayer-thick GaAs/AlAs quantum wells characterized by an indirect band gap and a type-Ⅱ band alignment. At cryogenic temperatures, the lifetimes of the excitons that are indirect both in real and k space are in the millisecond range. The exciton recombination time and the photoluminescence (PL) intensity are strongly dependent on strength and orientation of an applied magnetic field. In contrast to the very weak influence of an in-plane field, at 2 K temperature a field applied parallel to the growth axis drastically slows down the recombination and reduces the PL intensity. With increasing temperature the magnetic field effects on PL intensity and decay time are vanishing. The experimental data are well described by a model for the exciton dynamics that takes into account the magnetic-field-induced redistribution of the indirect excitons between their bright and dark states. It allows us to evaluate the lower bound of the heavy-hole longitudinal g factor of 2.5, the radiative recombination time for the bright excitons of 0.34 ms, and the nonradiative recombination time of the bright and dark excitons of 8.5 ms.
机译:在具有单能带隙和Ⅱ型能带排列特征的两层厚度的GaAs / AlAs量子阱中,对实验的激子复合动力学进行了实验和理论研究。在低温下,在实空间和k空间中间接激发的激子的寿命都在毫秒范围内。激子复合时间和光致发光(PL)强度强烈取决于所施加磁场的强度和方向。与面内电场的影响非常微弱相反,在2 K温度下,平行于生长轴施加的电场会大大减慢重组速度并降低PL强度。随着温度的升高,磁场对PL强度和衰减时间的影响逐渐消失。激子动力学模型很好地描述了实验数据,该模型考虑了间接激子在亮态和暗态之间的磁场诱导的重新分布。它使我们能够估计重孔纵向g因子的下限2.5,明亮的激子的辐射复合时间为0.34 ms,以及明亮和黑暗的激子的非辐射复合时间为8.5 ms。

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  • 来源
    《Physical review. B, Condensed Matter And Materals Physics》 |2016年第4期|045411.1-045411.10|共10页
  • 作者单位

    Rzhanov Institute of Semiconductor Physics, Siberian Branch of the Russian Academy of Sciences, 630090 Novosibirsk, Russia,Novosibirsk State University, 630090 Novosibirsk, Russia,Ural Federal University, 620002 Yekaterinburg, Russia;

    Experimentelle Physik 2, Technische Universitaet Dortmund, 44227 Dortmund, Germany;

    Experimentelle Physik 2, Technische Universitaet Dortmund, 44227 Dortmund, Germany,Ioffe Institute, Russian Academy of Sciences, 194021 St. Petersburg, Russia;

    Ioffe Institute, Russian Academy of Sciences, 194021 St. Petersburg, Russia;

    Ioffe Institute, Russian Academy of Sciences, 194021 St. Petersburg, Russia;

    Experimentelle Physik 2, Technische Universitaet Dortmund, 44227 Dortmund, Germany,Ioffe Institute, Russian Academy of Sciences, 194021 St. Petersburg, Russia;

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